Semiconductor Processing Methods of Forming Integrated Circuity

ABSTRACT

Semiconductor processing methods of forming integrated circuitry, and in particular, methods of forming such circuitry utilizing dual damascene technology, and resultant integrated circuitry constructions are described. In one embodiment, a substrate is provided having a circuit device. At least three layers are formed over the substrate and through which electrical connection is to be made with the circuit device. The three layers comprise first and second layers having an etch stop layer interposed therebetween. A contact opening is formed through the three layers and a patterned masking layer is formed over the three layers to define a conductive line pattern. Material of an uppermost of the first and second layers is selectively removed relative to the etch stop layer and defines a trough joined with the contact opening. Conductive material is subsequently formed within the trough and contact opening. In another embodiment, a contact opening is formed through a plurality of layers and has an aspect ratio of no less than about 10:1. A trench is defined in an uppermost layer of the plurality of layers proximate the contact opening. Conductive material is formed within the contact opening and at least a portion of the trench, with the conductive material being in electrical communication.

TECHNICAL FIELD

[0001] This invention relates to semiconductor processing methods of forming integrated circuitry, and in particular, to dual damascene processing methods, and resultant integrated circuitry constructions.

BACKGROUND OF THE INVENTION

[0002] Interconnection techniques are used in semiconductor processing to electrically interconnect devices over a semiconductor wafer. Historically, the semiconductor industry has used subtractive etch or lift off techniques as a primary metal-patterning technique. Subtractive techniques typically involve depositing a metal layer over a wafer and subsequently masking and etching metal material from over undesired portions of the wafer. Escalating density, performance, and manufacturing requirements associated with semiconductor wiring have led to changes in interconnection technology. To meet these needs, a technology called dual damascene has been developed. See for example, Kaanta, Damascene: A ULSI Wiring Technology, VMIC Conference, Jun. 11-12, 1991, page 144-152; Licata, Dual Damascene AL Wiring for 256M DRAM, VMIC Conference, Jun. 27-29, 1995, pages 596-602; U.S. Pat. Nos. 5,595,937, 5,598,027, 5,635,432, and 5,612,254.

[0003] This invention arose out of concerns associated with providing improved semiconductor processing methods and structures. In particular, the invention arose out of concerns associated with providing improved processing methods and structures which utilize and comprise dual damascene interconnection technology.

SUMMARY OF THE INVENTION

[0004] Semiconductor processing methods of forming integrated circuitry, and in particular, methods of forming such circuitry utilizing dual damascene technology, and resultant integrated circuitry constructions are described. In one embodiment, a substrate is provided having a circuit device. At least three layers are formed over the substrate and through which electrical connection is to be made with the circuit device. The three layers comprise first and second layers having an etch stop layer interposed therebetween. A contact opening is formed through the three layers and a patterned masking layer is formed over the three layers to define a conductive line pattern. Material of an uppermost of the first and second layers is selectively removed relative to the etch stop layer and defines a trough joined with the contact opening. Conductive material is subsequently formed within the trough and contact opening. In another embodiment, a contact opening is formed through a plurality of layers and has an aspect ratio of no less than about 10:1. A trench is defined in an uppermost layer of the plurality of layers proximate the contact opening. Conductive material is formed within the contact opening and at least a portion of the trench, with the conductive material being in electrical communication.

BRIEF DESCRIPTION OF THE DRAWINGS

[0005] Preferred embodiments of the invention are described below with reference to the following accompanying drawings.

[0006]FIG. 1 is a diagrammatic sectional view of a semiconductor wafer fragment in process in accordance with one embodiment of the invention.

[0007]FIG. 2 is a view of the FIG. 1 wafer fragment at a different processing step.

[0008]FIG. 3 is a view of the FIG. 2 wafer fragment at a different processing step.

[0009]FIG. 4 is a view of the FIG. 3 wafer fragment at a different processing step.

[0010]FIG. 5 is a view of the FIG. 4 wafer fragment at a different processing step.

[0011]FIG. 6 is a view of the FIG. 5 wafer fragment at a different processing step.

[0012]FIG. 7 is a view of the FIG. 6 wafer fragment at a different processing step.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0013] This disclosure of the invention is submitted in furtherance of the constitutional purposes of the U.S. Patent Laws “to promote the progress of science and useful arts” (Article 1, Section 8).

[0014] Referring to FIG. 1, semiconductor wafer fragment in process is indicated generally at 10 and comprises a semiconductive substrate 12. In the context of this document, the term “semiconductive substrate” is defined to mean any construction comprising semiconductive material, including, but not limited to, bulk semiconductive materials such as a semiconductive wafer (either alone or in assemblies comprising other materials thereon), and semiconductive material layers (either alone or in assemblies comprising other materials). The term “substrate” refers to any supporting structure, including, but not limited to, the semiconductive substrates described above.

[0015] Substrate 12 comprises a bulk monocrystalline substrate and includes field oxide regions 14. Various circuit devices with which electrical communication is desired are provided over or within substrate 12. In the illustrated example, such circuit devices include a plurality of conductive lines 16, diffusion regions 18, and a conductive plug 20. Conductive lines 16 typically include a polysilicon layer 22, a silicide layer 24, and an overlying insulative cap 26. Sidewall spacers 28 are typically provided over layers 24-26 as shown. Diffusion regions 18 can include any type of diffusion region, i.e. n+ or p+. Conductive plug 20 typically includes materials such as conductively doped polysilicon. Circuit devices 16, 18, and 20 are shown for illustrative purposes only. Accordingly, other circuit devices are possible and can include other interconnect material.

[0016] Referring to FIG. 2, a plurality of layers 30 are formed over substrate 12. In the illustrated example, three layers are formed over the substrate and include a first layer 32, a second layer 34 spaced apart from first layer 32, and an intervening third layer 36 separating the first and second layers. The illustrated layers constitute layers through which electrical connection is to be made with at least one, and preferably more, circuit devices. In a preferred embodiment, third layer 36 constitutes an etch stop layer for purposes which will become evident below.

[0017] Preferably, first layer 32 comprises a first insulative oxide layer which is formed over the substrate, and subsequently planarized as by mechanical abrasion, e.g. chemical mechanical polishing (CMP), or etchback techniques. An exemplary material is borophosphosilicate glass (BPSG) formed to a thickness of around 20,000 Angstroms. Etch stop layer 36 is preferably a nitride-comprising material such as silicon nitride, and can be formed or deposited over first layer 32 through plasma enhanced chemical vapor deposition techniques to an exemplary thickness of from 250 Angstroms to 10,000 Angstroms, with 300 Angstroms being preferred. For purposes of the ongoing discussion, layer 36 constitutes a next adjacent layer relative to layer 34. An exemplary material for layer 34 comprises an oxide material such as undoped SiO₂, which can be deposited by decomposition of tetraethylorthosilicate (TEOS). An example thickness is between about 5000 to 10,000 Angstroms.

[0018] Referring to FIG. 3, a patterned masking layer 38 is formed over substrate 12 and defines a plurality of masking layer openings 40 through which contact openings are to be etched. An exemplary material for layer 38 is photoresist.

[0019] Referring to FIG. 4, contact openings 42 are formed through the plurality of layers 30 and down to the respective circuit devices with which electrical communication is desired. Exemplary etch techniques for forming the contact openings include plasma etching. The photoresist can be subsequently stripped, as shown.

[0020] In the illustrated example, contact openings 42 are formed contemporaneously through the three layers 32, 34, and 36, and in a common step. The contact openings respectively extend to proximate a portion of the substrate with which electrical communication is desired. The leftmost contact opening 42 exposes a top portion of the leftmost conductive line 16. Insulative cap 26 can subsequently be etched to expose the conductive portions of the line. The centermost contact opening 42 exposes a portion of conductive plug 20. The rightmost contact opening 42 exposes a portion of the rightmost diffusion region 18. Preferably, at least one of the contact openings has an aspect ratio no less than about 10:1. In the illustrated example, rightmost contact opening 42 has the desired 10:1 aspect ratio, although such is not shown to scale.

[0021] Referring to FIG. 5, a portion of the insulative cap over the leftmost conductive line 16 has been removed to facilitate electrical connection therewith. A patterned masking layer 44 is formed over the plurality of layers 30 and defines a trench pattern, trough pattern, or conductive line pattern over the substrate. An exemplary material for masking layer 44 is photoresist. At least some of the photoresist 44 can remain within contact openings 42 as shown. Such remnant photoresist can serve to protect the device area. Although the trench patterns are illustrated as being generally wider in dimension than the respective contact openings proximate which each is disposed, the patterns could have other dimensions, e.g. narrower or the same width dimensions as the contact openings.

[0022] Referring to FIG. 6, material of uppermost insulative oxide layer 34 is etched or otherwise removed substantially selectively relative to etch stop layer 36. Such layer can be plasma etched to provide a somewhat graded or beveled opening. Such defines trenches or troughs 46 which are joined with the respective contact openings over which each is formed. The trench and contact openings are formed to at least partially overlap with one another. The illustrated troughs can be formed while photoresist is within the contact openings. The photoresist will be subsequently stripped.

[0023] Referring to FIG. 7, contact openings 42 and trenches or troughs 46 are filled, in a common step, with conductive material 48 which can be subsequently planarized, as by CMP, to isolate it within the contact openings and associated troughs. Accordingly, the conductive material within a particular contact opening is in electrical communication with conductive material within an associated trough. Various materials and techniques can be utilized to form the conductive material within the openings and troughs. Such include aluminum alloys formed through hot sputtering and reflow techniques, ionized plasma, hot pressure fill, and PVD/CVD combinations.

[0024] In a preferred embodiment, a layer of titanium can be deposited to a thickness of between about 250 Angstroms to 1,000 Angstroms, with 700 Angstroms being preferred. Thereover, a layer of titanium nitride can be deposited to a thickness of between about 150 Angstroms to 600 Angstroms, with 300 Angstroms being preferred. Either or both of the above layers can be deposited by chemical vapor deposition, physical vapor deposition, or other techniques. The wafer or substrate can then be subjected to rapid thermal processing (RTP) in a nitrogen ambient, at atmospheric pressure, and at temperatures between about 600° C. to 800° C. Preferably, such temperature processing takes place in a dual ramping step in which in a first step, the temperature is raised to about 650° C. at a rate of 20° C. per second. Upon achieving 650° C., the wafer is held for approximately 20 seconds at 650° C. Thereafter, the temperature is raised again, from 650° C. to 720° C. at the same ramp rate of 20° C. per second. The wafer is then held at 720° C. for one second. Subsequently, aluminum can be deposited through various techniques including chemical vapor deposition followed by physical vapor deposition.

[0025] In compliance with the statute, the invention has been described in language more or less specific as to structural and methodical features. It is to be understood, however, that the invention is not limited to the specific features shown and described, since the means herein disclosed comprise preferred forms of putting the invention into effect. The invention is, therefore, claimed in any of its forms or modifications within the proper scope of the appended claims appropriately interpreted in accordance with the doctrine of equivalents. 

1. A semiconductor processing method of forming integrated circuitry comprising: providing a substrate having a circuit device; forming at least three layers over the substrate and through which electrical connection is to be made with the circuit device, the three layers comprising first and second layers having an etch stop layer interposed therebetween; forming a contact opening through the three layers; after forming the contact opening, forming a patterned masking layer over the three layers comprising a conductive line pattern; and selectively removing material of an uppermost of the first and second layers relative to the etch stop layer and defining a trough joined with the contact opening.
 2. The semiconductor processing method of claim 1 further comprising forming conductive material within the trough and the contact opening.
 3. The semiconductor processing method of claim 1, wherein the circuit device comprises a conductive line, and the forming of the contact opening comprises exposing conductive portions of the conductive line.
 4. The semiconductor processing method of claim 1, wherein the substrate comprises a bulk monocrystalline substrate and the circuit device comprises a diffusion region received therewithin, and the forming of the contact opening comprises exposing a portion of the diffusion region.
 5. The semiconductor processing method of claim 1, wherein the forming of the contact opening comprises forming the contact opening to have an aspect ratio no less than about 10:1.
 6. The semiconductor processing method of claim 1, wherein one of the first and etch stop layers comprises an oxide material, and the other of the layers comprises a nitride material.
 7. The semiconductor processing method of claim 1, wherein the first and second layers comprise an oxide material, and the etch stop layer comprises a nitride material.
 8. A semiconductor processing method of forming integrated circuitry comprising: forming a contact opening through a plurality of layers which are formed over a substrate, the contact opening having an aspect ratio no less than about 10:1; forming a trench in an uppermost layer of the plurality of layers proximate the contact opening, the trench and contact opening being formed to at least partially overlap one another; and forming conductive material within the contact opening and the trench in a common step.
 9. The semiconductor processing method of claim 8, wherein the contact opening has an aspect ratio of 10:1.
 10. The semiconductor processing method of claim 8, wherein the plurality of layers comp rise a pair of spaced-apart first and second layers separated by an etch stop layer.
 11. The semiconductor processing method of claim 8, wherein the plurality of layers comprise a pair of spaced-apart first and second oxide layers separated by an etch stop layer.
 12. The semiconductor processing method of claim 8, wherein the plurality of layers comprise a pair of spaced-apart first and second oxide layers separated by an etch stop layer comprising nitride.
 13. The semiconductor processing method of claim 8, wherein the forming of the trench comprises forming a patterned masking layer over the substrate and etching an uppermost layer of the plurality of layers.
 14. The semiconductor processing method of claim 8, wherein the forming of the trench comprises forming a patterned masking layer over the substrate and selectively etching an uppermost layer of the plurality of layers relative to an underlying layer of the plurality of layers.
 15. The semiconductor processing method of claim 8, wherein the plurality of layers comprise a pair of spaced-apart first and second layers separated by an etch stop layer, and the forming of the trench comprises forming a patterned masking layer over the substrate and selectively etching an uppermost layer of the first and second layers relative to the etch stop layer.
 16. A semiconductor processing method of forming integrated circuitry comprising: forming a contact opening through a plurality of layers which are formed over a substrate, the contact opening extending to proximate a portion of the substrate with which electrical communication is desired; after forming the contact opening, selectively removing material of an uppermost layer of the plurality of layers relative to a next adjacent layer to define a trench which joins with the contact opening; and filling the contact opening and at least a portion of the trench with conductive material.
 17. The semiconductor processing method of claim 16, wherein the plurality of layers comprise three layers.
 18. The semiconductor processing method of claim 16, wherein the plurality of layers comprise three layers, the uppermost layer comprising an oxide material.
 19. The semiconductor processing method of claim 16, wherein the substrate portion comprises a diffusion region.
 20. The semiconductor processing method of claim 16, wherein the forming of the contact opening comprises forming said opening to have an aspect ratio no less than about 10:1.
 21. The semiconductor processing method of claim 16, wherein the removing of the material of the uppermost layer comprises: forming a patterned masking layer over the substrate and defining a trench pattern; and selectively etching said uppermost layer through the patterned masking layer.
 22. The semiconductor processing method of claim 16, wherein: the plurality of layers comprise three layers; and the removing of the material of the uppermost layer comprises forming a patterned masking layer over the substrate and defining a trench pattern, and selectively etching said uppermost layer through the patterned masking layer.
 23. The semiconductor processing method of claim 16, wherein: the plurality of layers comprise three layers, the uppermost layer comprising an oxide material and the next adjacent layer comprising a nitride layer; and the removing of the material of the uppermost layer comprises forming a patterned masking layer over the substrate and defining a trench pattern, and selectively etching said uppermost layer through the patterned masking layer.
 24. A semiconductor processing method of forming integrated circuitry comprising: forming a first insulative oxide layer over a circuit device supported by a substrate; forming a nitride-comprising etch stop layer over the first insulative oxide layer; forming a second insulative oxide layer over the nitride-comprising etch stop layer; contemporaneously forming a contact opening through the second insulative oxide layer, the nitride-comprising etch stop layer, and the first insulative oxide layer extending to proximate a portion of the substrate with which electrical communication is desired; forming a patterned masking layer over the substrate; selectively removing material of the second insulative oxide layer relative to the nitride-comprising etch stop layer through the patterned masking layer and defining a trench within the second insulative oxide layer; and filling the contact opening and at least a portion of the trench with conductive material.
 25. The semiconductor processing method of claim 24, wherein the forming of the contact opening comprises forming the contact opening to have an aspect ratio no less than about 10:1.
 26. The semiconductor processing method of claim 24, wherein circuit device comprises a diffusion region.
 27. The semiconductor processing method of claim 24, wherein the filling of the contact opening and the trench portion with conductive material comprises filling said opening and said trench portion with conductive material which is in electrical communication.
 28. A semiconductor processing method of forming integrated circuitry comprising: providing a substrate having a circuit device; forming at least three layers over the substrate and through which electrical connection is to be made with the circuit device, the three layers comprising first and second layers having an etch stop layer interposed therebetween; in a common step, forming a contact opening through the three layers; forming a layer of photoresist over the substrate; patterning the photoresist to define a conductive line pattern, at least some of the photoresist being received within the contact opening; and while photoresist is within the contact opening, selectively removing material of an uppermost of the first and second layers relative to the etch stop layer and defining a trough joined with the contact opening.
 29. Dual damascene-configured integrated circuitry comprising: a substrate; a circuit device supported by the substrate; at least one layer of material over the substrate; a dual damascene contact opening extending through the at least one layer of material and connecting with the circuit device, the contact opening having an aspect ratio no less than about 10:1; and conductive material disposed within the contact opening and in electrical communication with the circuit device.
 30. The dual damascene-configured integrated circuitry of claim 29, wherein the at least one layer comprises three layers. 